The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
Copyrights notice
The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
중합체성 박막은 중합체의 직접 증발, 두 단량체의 공동 증발에 이어 중첨가 또는 중축합 반응, 또는 단일 단량체의 증발에 이어 연쇄 중합과 같은 여러 방식의 물리적 기상 증착에 의해 제조될 수 있습니다. 이온화 보조 증착(IAD)은 중합 반응 활성화 및 쌍극자 배향 정렬과 같은 특수한 특성을 갖는 새로운 폴리머 증착 방법으로 제안되었습니다. 이러한 메커니즘은 유기발광다이오드, 압전소자 등의 응용을 목표로 하는 비닐폴리머 및 폴리우레아 박막 형성에 활용됐다.
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Hiroaki USUI, "Deposition of Polymeric Thin Films by Ionization-Assisted Method" in IEICE TRANSACTIONS on Electronics,
vol. E83-C, no. 7, pp. 1128-1133, July 2000, doi: .
Abstract: Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e83-c_7_1128/_p
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@ARTICLE{e83-c_7_1128,
author={Hiroaki USUI, },
journal={IEICE TRANSACTIONS on Electronics},
title={Deposition of Polymeric Thin Films by Ionization-Assisted Method},
year={2000},
volume={E83-C},
number={7},
pages={1128-1133},
abstract={Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.},
keywords={},
doi={},
ISSN={},
month={July},}
부
TY - JOUR
TI - Deposition of Polymeric Thin Films by Ionization-Assisted Method
T2 - IEICE TRANSACTIONS on Electronics
SP - 1128
EP - 1133
AU - Hiroaki USUI
PY - 2000
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E83-C
IS - 7
JA - IEICE TRANSACTIONS on Electronics
Y1 - July 2000
AB - Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.
ER -