The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
Copyrights notice
The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
Y의 저온 증착2O3 80에서°C는 트리스(부틸사이클로펜타디에닐)이트륨(Y(BuCp)의 이트륨 전구체를 사용하여 연구됩니다.3) 및 플라즈마는 가습 아르곤 산화기를 빠져나갔습니다. 증착은 원자층 증착 순서를 사용하여 시연됩니다. Y(BuCp)3 산화 가스는 시간에 따라 별도로 반응 챔버에 도입되고 이러한 주입이 반복됩니다. 가스 도입 조건을 결정하기 위해 Y(BuCp)의 표면 반응3 흡착과 산화는 다음과 같이 관찰됩니다. 원위치 IR 흡수 분광법. 증착된 필름은 완전히 산화된 Y로 확인됩니다.2O3 X선 광전자 분광법으로. 본 증착은 Y 증착에 적용 가능합니다.2O3 유연한 폴리에틸렌 테레프탈레이트 필름 위의 필름.
Kentaro SAITO
Yamagata University
Kazuki YOSHIDA
Yamagata University
Masanori MIURA
Yamagata University
Kensaku KANOMATA
Yamagata University
Bashir AHMMAD
Yamagata University
Shigeru KUBOTA
Yamagata University
Fumihiko HIROSE
Yamagata University
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Kentaro SAITO, Kazuki YOSHIDA, Masanori MIURA, Kensaku KANOMATA, Bashir AHMMAD, Shigeru KUBOTA, Fumihiko HIROSE, "Low-Temperature Deposition of Yttrium Oxide on Flexible PET Films Using Time-Separated Yttrium Precursor and Oxidizer Injections" in IEICE TRANSACTIONS on Electronics,
vol. E105-C, no. 10, pp. 604-609, October 2022, doi: 10.1587/transele.2021FUP0002.
Abstract: Low-temperature deposition of Y2O3 at 80°C is studied using an yttrium precursor of tris(butylcyclopentadienyl)yttrium (Y(BuCp)3) and plasma exited humidified argon oxidizer. The deposition is demonstrated using an atomic-layer-deposition sequence; the Y(BuCp)3 and the oxidizing gases are time separately introduced to the reaction chamber and these injections are repeated. To determine the gas introduction conditions, surface reactions of Y(BuCp)3 adsorption and its oxidization are observed by an in-situ IR absorption spectroscopy. The deposited film is confirmed as fully oxidized Y2O3 by X-ray photoelectron spectroscopy. The present deposition is applicable for the deposition of Y2O3 film on flexible polyethylene terephthalate films.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/transele.2021FUP0002/_p
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@ARTICLE{e105-c_10_604,
author={Kentaro SAITO, Kazuki YOSHIDA, Masanori MIURA, Kensaku KANOMATA, Bashir AHMMAD, Shigeru KUBOTA, Fumihiko HIROSE, },
journal={IEICE TRANSACTIONS on Electronics},
title={Low-Temperature Deposition of Yttrium Oxide on Flexible PET Films Using Time-Separated Yttrium Precursor and Oxidizer Injections},
year={2022},
volume={E105-C},
number={10},
pages={604-609},
abstract={Low-temperature deposition of Y2O3 at 80°C is studied using an yttrium precursor of tris(butylcyclopentadienyl)yttrium (Y(BuCp)3) and plasma exited humidified argon oxidizer. The deposition is demonstrated using an atomic-layer-deposition sequence; the Y(BuCp)3 and the oxidizing gases are time separately introduced to the reaction chamber and these injections are repeated. To determine the gas introduction conditions, surface reactions of Y(BuCp)3 adsorption and its oxidization are observed by an in-situ IR absorption spectroscopy. The deposited film is confirmed as fully oxidized Y2O3 by X-ray photoelectron spectroscopy. The present deposition is applicable for the deposition of Y2O3 film on flexible polyethylene terephthalate films.},
keywords={},
doi={10.1587/transele.2021FUP0002},
ISSN={1745-1353},
month={October},}
부
TY - JOUR
TI - Low-Temperature Deposition of Yttrium Oxide on Flexible PET Films Using Time-Separated Yttrium Precursor and Oxidizer Injections
T2 - IEICE TRANSACTIONS on Electronics
SP - 604
EP - 609
AU - Kentaro SAITO
AU - Kazuki YOSHIDA
AU - Masanori MIURA
AU - Kensaku KANOMATA
AU - Bashir AHMMAD
AU - Shigeru KUBOTA
AU - Fumihiko HIROSE
PY - 2022
DO - 10.1587/transele.2021FUP0002
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E105-C
IS - 10
JA - IEICE TRANSACTIONS on Electronics
Y1 - October 2022
AB - Low-temperature deposition of Y2O3 at 80°C is studied using an yttrium precursor of tris(butylcyclopentadienyl)yttrium (Y(BuCp)3) and plasma exited humidified argon oxidizer. The deposition is demonstrated using an atomic-layer-deposition sequence; the Y(BuCp)3 and the oxidizing gases are time separately introduced to the reaction chamber and these injections are repeated. To determine the gas introduction conditions, surface reactions of Y(BuCp)3 adsorption and its oxidization are observed by an in-situ IR absorption spectroscopy. The deposited film is confirmed as fully oxidized Y2O3 by X-ray photoelectron spectroscopy. The present deposition is applicable for the deposition of Y2O3 film on flexible polyethylene terephthalate films.
ER -